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We provide a variety of coating services with
the latestequipment including
E-beam Vacuum Coater /
Sputter coater / Plasma Clean System, etc.

Features
  • We provide customized design available to fit coating film durability and a variety of environmental conditions, and process reliability tests of the coating film.
  • We have a coating technology and measurement technology ranging from Deep UV to FLIR.
  • We have a chamber of up to Ø 3200 and a variety of 2M-grade coating is possible.
  • We can precisely measure up to 193nm ~ 14um.
  • You can discuss the skilled coating engineer on specifications at any time.
  • We have facilities capable of handling up to mass production from a small sample.
Coating Sectors

<Deep UV(193nm AR)>



· 투과율 : T≥99.5%@193nm · 면 반사율 : R≥0.25%@193nm · size : ~dia2000mm

<Deep UV(193nm HR)>



· 투과율 : R≥99%@193nm · 면 반사율 : 0~45deg · size : ~dia2000mm

<UV(308nm AR)>



· 투과율 : T≥99.5%@308nm · Substrate : F/S, Sapphire, CaF2 · size : ~dia2000mm

<UV(308nm HR)>



· 반사율 : R≥99.5%@308nm · 입사각 : 0~45deg · size : ~dia2000mm

<UV AR(G H I Line)>



· 투과율 : T≥99.5%@g h i · 입사각 : 0~45deg · size : ~dia2000mm

<UV Cold Mirror(G H I Line)>



· 반사율 : Tavg≥99%@g h i · 입사각 : 0~45deg · size : ~dia2000mm

<Filter>



· Cutoff filter, LWPF, SWPF · 입사각 : 0~45deg · size : ~dia2000mm

<Band Pass Filter>



· 반치폭 : 7nm~ · 입사각 : 0~45deg · size : ~dia2000mm

<Beam Splitter>



· T:R = 5:5, 7:3, 6:4 · 입사각 : 0~45deg · size : ~dia2000mm

<M-IR AR(Ge, Si, ZnS, ZnSe)>



· 3.5~5㎛ 평균 투과율 99%이상 · size : ~dia300mm

<M-IR Filter>



· LWPF, SWPF, BPF · size : ~dia300mm

<F-IR AR (Ge, ZnS, ZnSe)>



· 8~12㎛ 평균 투과율 95% · 평균 투과율 98%로 개선 중 · size : ~dia300mm

Product Photos